MATSUSHITA ELECTRONICS CORPORATION.
| Keywords | Layer, Silicon, Dioxide, Photoresist, Method, Device, Phosphorus, Invention, Semiconductor, Material |
| Ministry/ Department/ Residency | The Patent Office |
| Branch | Indian Patent File |
| From Year / Date (YYYY-MM-DD) |
1965 |
| To Year / Date (YYYY-MM-DD) |
1967 |
| Source Organization | NA |
| Identifier | NAIBHF00028780 |
| File No./Reference No./Sheet No./Folio No. | 109646 |
| Location | BBSR-R1 |
| Part No. | NA |
| File Size | 33.8 MB |
| Pages | 43 |
| Call Number | NA |
| Publisher | NA |
| Subject | MATSUSHITA ELECTRONICS CORPORATION. |
| Creator | NA |
| Accession Number | NA |
| Series | NA |
| Year of Publication | NA |
| Language | English |
| Bundle Barcode | NAIBHB00000922 |
| Location Code | 0 |
| File Barcode | NAIBHF00028780 |
| QC Certificate No. | QC_20250201BH |
| Bundle No. | 730 |
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